Effect of Acidic Hydrogen Peroxide and Lysine Slurry on Ovonic Threshold Switch Film in Chemical Mechanical Polishing

Autor:	Chenghsing Li, Daolin Cai, Weili Liu, Wencheng Fang, Zijing Cui, Zhitang Song
Rok vydání:	2022
Předmět:	Electronic Optical and Magnetic Materials
Zdroj:	ECS Journal of Solid State Science and Technology. 11:084004
ISSN:	2162-8777 2162-8769
Popis:	For improving the three-dimensional structure of phase-change memory devices, Ovonic threshold switch devices have received renewed attention as selectors owing to a simple production process, good scalability, and excellent performance. It can replace transistors and diodes in the available technology. In this article, we studied the GeSe-based chemical mechanical polishing process. The different concentrations of hydrogen peroxide and lysine interacting with GeSe in chemical mechanical polishing were investigated. Material characterization was performed by scanning electron microscopy and atomic force microscopy. In addition, the reaction mechanism in the chemical mechanical polishing process was analyzed by electrochemical experiments and X-ray photoelectron spectroscopy.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::65df0c3a347a36893162fc5a8d05ac31 https://doi.org/10.1149/2162-8777/ac8831 Zobrazit plný text záznamu