Chemical and Electrochemical Nanofabrication Processes for Schottky In-Plane Gate GaAs Single and Coupled Quantum Wire Transistors
Autor: | Seiya Kasai, Hideki Hasegawa, Hiroshi Okada, Jin Nakamura, Masanobu Iwaya |
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Rok vydání: | 2000 |
Předmět: | |
Zdroj: | Japanese Journal of Applied Physics. 39:4651 |
ISSN: | 1347-4065 0021-4922 |
DOI: | 10.1143/jjap.39.4651 |
Popis: | Chemical and electrochemical nanofabrication processes used for fabricating GaAs-based single and coupled quantum wire transistors (QWTrs) utilizing Schottky in-plane gate (IPG) structures are described. IPG and metal dot formation processes using a wet chemical etching and an in situ electrochemical process were optimized for a novel nanodevice fabrication. Fabricated single and coupled QWTrs showed conductance quantization and oscillation characteristics at low temperatures, demonstrating the tight gate control capability. |
Databáze: | OpenAIRE |
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