Ru Films from Bis(ethylcyclopentadienyl)ruthenium Using Ozone as a Reactant by Atomic Layer Deposition for Capacitor Electrodes
| Autor: | Jae-Sung Roh, Ji-Hoon Ahn, Jin-Hyock Kim, Sungki Park, Deok-Sin Kil, Ja-Yong Kim, Se-Hun Kwon |
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| Rok vydání: | 2012 |
| Předmět: |
Auger electron spectroscopy
Ozone Renewable Energy Sustainability and the Environment Chemistry Inorganic chemistry Nucleation chemistry.chemical_element Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Ruthenium Capacitor chemistry.chemical_compound Atomic layer deposition law Electrode Materials Chemistry Electrochemistry Deposition (law) |
| Zdroj: | Journal of The Electrochemical Society. 159:H560-H564 |
| ISSN: | 1945-7111 0013-4651 |
| DOI: | 10.1149/2.069206jes |
| Popis: | Ru films were produced by atomic layer deposition (ALD) with an alternating supply of bis(ethylcyclopentadienyl)ruthenium (Ru(EtCp)2) and ozone at deposition temperatures of 225‐275 ◦ C. Ozone acted as an effective reactant for Ru(EtCp)2 .T he Ru fi lm thicknesses formed during one cycle were saturated at relatively high values of 0.09‐0.12 nm/cycle depending on the deposition temperatures, and their resistivities were about 16 μ cm. Moreover, a reduced nucleation delay was found for Ru ALD using ozone when compared to Ru ALD using oxygen gas. The amount of oxygen impurity incorporated into the Ru films was less than 1 at%, as determined by Auger electron spectroscopy. The interfacial adhesion property between Ru films prepared via ALD using ozone (ozone-Ru) and ZrO2 was good and 80% step coverage was achieved on a 3-D structure with a very high aspect ratio of 16:1, making them suitable for use as a top electrode material. |
| Databáze: | OpenAIRE |
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