Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture
| Autor: | Seno Rekawa, Patrick P. Naulleau, Kenneth A. Goldberg, Hak-Seung Han, C. D. Kemp, Iacopo Mochi, Sungmin Huh, E. H. Anderson, R. F. Gunion |
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| Rok vydání: | 2008 |
| Předmět: | |
| Zdroj: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2220-2224 |
| ISSN: | 1520-8567 1071-1023 |
| Popis: | The SEMATECH Berkeley actinic inspection tool (AIT) is an extreme ultraviolet (EUV)-wavelength mask inspection microscope designed for direct aerial image measurements and precommercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a charge coupled device camera. The authors present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100nm mask features and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and numerical aperture (NA) values up to 0.0875, emulating the spatial resolution of a 0.35NA 4× EUV stepper. Illumination uniformity is above 90% for mask areas 2μm wide and smaller. An angle-scanning mirror reduces the high ... |
| Databáze: | OpenAIRE |
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