Mass sensor for in situ monitoring of focused ion and electron beam induced processes
Autor: | Ivo Utke, Vinzenz Friedli, Christian Santschi, Patrik Hoffmann, Johann Michler |
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Rok vydání: | 2007 |
Předmět: | |
Zdroj: | Applied Physics Letters. 90:053106 |
ISSN: | 1077-3118 0003-6951 |
DOI: | 10.1063/1.2435611 |
Popis: | A cantilever-based mass sensor for in situ monitoring of deposition and milling using focused ion and electron beams is presented. Carefully designed experiments allowed for mass measurements with a noise level of ±10fg by tracking the resonance frequency of a temperature stabilized piezoresistive cantilever using phase locking. The authors report on measurements of precursor surface coverage, residence time, mass deposition rates, yields, and deposit density using the (CH3)3PtCpCH3 precursor. |
Databáze: | OpenAIRE |
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