The mechanical properties of alumina films formed by plasma deposition and by ion irradiation of sapphire

Autor:	David M. Follstaedt, D.L. Linam, James Arthur Knapp, K.G. Minor, J. C. Barbour, T.M. Mayer
Rok vydání:	2000
Předmět:	Nuclear and High Energy Physics Materials science Analytical chemistry chemistry.chemical_element Nanoindentation Electron beam physical vapor deposition Amorphous solid chemistry Aluminium Phase (matter) Sapphire Irradiation Instrumentation Elastic modulus
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :140-147
ISSN:	0168-583X
DOI:	10.1016/s0168-583x(99)00648-5
Popis:	This paper examines the correlation between mechanical properties and the density, phase and hydrogen content of deposited alumina layers, and compares them to those of sapphire and amorphous alumina synthesized through ion-beam irradiation of sapphire. Alumina films were deposited using electron beam evaporation of aluminum and co-bombardment with O 2 + ions (30–230 eV) from an electron–cyclotron resonance (ECR) plasma. The H content and phase were controlled by varying the deposition temperature and the ion energy. Sapphire was amorphized at 84 K by irradiation with Al and O ions (in stoichiometric ratio) to a defect level of 4 dpa in order to form an amorphous layer 370 nm thick. Nanoindentation was performed to determine the elastic modulus, yield strength and hardness of all materials. Sapphire and amorphized sapphire have a higher density and exhibit superior mechanical properties in comparison to the deposited alumina films. Density was determined to be the primary factor affecting the mechanical properties, which showed only a weak correlation to the hydrogen content.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5d8bdff973959777732c727d5c1f6ce7 https://doi.org/10.1016/s0168-583x(99)00648-5 Zobrazit plný text záznamu Full Text from ScienceDirect