Advanced surface inspection techniques for SOI wafers

Autor:	Mari Nozoe, Aritoshi Sugimoto, Takahide Ikeda
Rok vydání:	1998
Předmět:	Materials science business.industry Silicon on insulator Laser Noise (electronics) Light scattering law.invention Micrometre law Surface roughness Electronic engineering Optoelectronics Wafer business Failure mode and effects analysis
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
Popis:	In this paper, it is described that (1) Various type of SOI wafers have each optimum laser illumination mode, (2) Using this optimum laser illumination, 0.1 - 0.3 micrometer particle detection sensitivity has been achieved. (3) By measuring the noise element of scattered light from SOI surface, failure mode can be determined. The performance of the particle detection for each type of wafer and the result of surface roughness failure is also discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5ad8cf31085215bd9f78697456b17e0d https://doi.org/10.1117/12.308756 Zobrazit plný text záznamu