Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films
| Autor: | Pascal Tristant, J. Desmaison, F. Naudin, H. Hidalgo, D. Merle |
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| Rok vydání: | 2001 |
| Předmět: |
Materials science
Hybrid physical-chemical vapor deposition Mechanical Engineering Inorganic chemistry Oxide Chemical vapor deposition Combustion chemical vapor deposition Ion source chemistry.chemical_compound chemistry Mechanics of Materials Plasma-enhanced chemical vapor deposition General Materials Science Plasma processing |
| Zdroj: | Key Engineering Materials. :559-562 |
| ISSN: | 1662-9795 |
| DOI: | 10.4028/www.scientific.net/kem.206-213.559 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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