Adhesive failure of gold films on tantalum pentoxide produced by MeV ion irradiation

Autor:	C.J. Sofield, L.B. Bridwell, S. Sugden
Rok vydání:	1990
Předmět:	Nuclear and High Energy Physics Materials science Hydrogen Gold film Inorganic chemistry Radiochemistry chemistry.chemical_element Adhesion Ion chemistry.chemical_compound chemistry Tantalum pentoxide Tantalum oxide Irradiation Adhesive Instrumentation
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 48:485-488
ISSN:	0168-583X
DOI:	10.1016/0168-583x(90)90167-s
Popis:	Here we report work on the MeV irradiation adhesion modification of gold films on deposited tantalum pentoxide. For this system irradiation produces bubbling of the film at comparatively low doses, which in some cases leads directly to failure of the gold film. This is in contrast to the results of irradiation of gold on native or thermally grown tantalum oxide samples where enhanced adhesion is observed. Irradiation by 5 × 10 13 ions/cm 2 of 20 MeV 35 Cl and 1 × 10 13 ions/cm 2 of 40 MeV 81 Br were observed to release 100 and 5000 H atoms per ion, respectively. The nature of the bonding of the hydrogen and the details of the ion-induced release are unknown, although electronic stopping is thought to be the driving force rather than bulk heating effects.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::58735719030963ae627afb7b68b5454c https://doi.org/10.1016/0168-583x(90)90167-s Zobrazit plný text záznamu