Low-temperature atmospheric pressure chemical vapor deposition of titanium disulfide films
Autor: | Charles H. Winter, T. Suren Lewkebandara, James W. Proscia |
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Rok vydání: | 1992 |
Předmět: |
chemistry.chemical_classification
Hybrid physical-chemical vapor deposition Titanium disulfide General Chemical Engineering Inorganic chemistry General Chemistry Chemical vapor deposition Combustion chemical vapor deposition chemistry.chemical_compound Carbon film chemistry Materials Chemistry Deposition (phase transition) Thin film Inorganic compound |
Zdroj: | Chemistry of Materials. 4:1144-1146 |
ISSN: | 1520-5002 0897-4756 |
DOI: | 10.1021/cm00024a007 |
Databáze: | OpenAIRE |
Externí odkaz: |