Stability improvement at high emission densities for gold thin film photocathodes used in advanced electron beam lithography

Autor: Bart G. Scholte van Mast, C. N. Berglund, Jack M. Mccarthy, J. L. House, G. Janaway, Suresh W. Gosavi
Rok vydání: 2001
Předmět:
Zdroj: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:2591
ISSN: 0734-211X
DOI: 10.1116/1.1418414
Popis: Multi-electron beam lithography has been proposed as a promising approach to achieve high throughput for mask writing and direct wafer writing. Laser driven photocathodes represent an attractive candidate for multiple beam, high brightness sources. Thin film gold photocathodes that can be handled in air are of particular interest because of their potential for practical sources. In this article we present a study of the degradation mechanisms that change photocurrent yield for thin film gold photocathodes. Two general degradation mechanisms were studied: microstructural changes of the gold thin film and surface reactions. Observed microstructural changes included loss of gold coverage of the sapphire substrate, gold grain growth and an increase in surface roughness. A titanium adhesion layer was shown to stabilize coverage and proved stable to 700 °C by in situ transmission electron microscopy (TEM) experiments on planar sections of the Au/Ti/sapphire thin film stack photocathode. Reactions at the surface...
Databáze: OpenAIRE