Two-Photon-Lithography Substrate Reflection and Absorption Compensation for Additive Manufacturing of Metamaterials on MEMS

Autor:	Sandro G. Koch, Severin Schweiger, Harald Schenk
Rok vydání:	2021
Předmět:	Microelectromechanical systems Fabrication Materials science business.industry Reflection (physics) Physics::Optics Metamaterial Optoelectronics business Multiphoton lithography Absorption (electromagnetic radiation) Compensation (engineering) Photonic metamaterial
Zdroj:	2021 44th International Spring Seminar on Electronics Technology (ISSE).
Popis:	Structuring polymers on micro-electro-mechanical-systems (MEMS) for the manufacturing of acoustical and optical metamaterials using the two-photon polymerization process depends on reliable and controllable regulation of the intensity. Reflecting surfaces, diffracting elements and structures with poor heat dissipation can be problematic obstacles for the incident focused and pulsed laser beam. Thermal and optical simulations were performed and compared to test structures. A compensated fabrication approach was successfully applied to create optimized conditions in the polymerized volume.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::567ca0a32b44abe74163659eef508536 https://doi.org/10.1109/isse51996.2021.9467575 Zobrazit plný text záznamu