Electrical properties of pure and metal doped pulsed laser deposited carbon films
| Autor: | B. Angleraud, Corinne Champeaux, Alain Catherinot, Pierre Abelard, Jean-Christophe Orlianges, Arnaud Pothier, Pierre Blondy |
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| Rok vydání: | 2004 |
| Předmět: |
Materials science
Laser ablation business.industry Ultra-high vacuum Doping Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Surfaces Coatings and Films Electronic Optical and Magnetic Materials Pulsed laser deposition Condensed Matter::Materials Science Carbon film X-ray photoelectron spectroscopy chemistry Condensed Matter::Superconductivity Materials Chemistry Optoelectronics Condensed Matter::Strongly Correlated Electrons Thin film business Carbon |
| Zdroj: | Thin Solid Films. :291-295 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2003.11.278 |
| Popis: | Nickel and tantalum doped carbon films have been deposited under high vacuum by KrF laser ablation at ambient temperature. A computer controlled multi-target system allows predefined sequences of laser shots on the carbon and metallic targets, respectively, and consequently a well controlled metal doping of deposited carbon film. Electrical properties of pure and metal doped carbon films have been investigated and chemical bonding and film compositions determined using X-ray photoelectron spectroscopy (XPS). Finally, doped carbon films are integrated in fabrication of RF MEMS switches. |
| Databáze: | OpenAIRE |
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