HPPMS deposition from composite targets: Effect of two orders of magnitude target power density changes on the composition of sputtered Cr-Al-C thin films
| Autor: | Jochen M. Schneider, Holger Rueß, Daniel Primetzhofer, Stanislav Mráz, Szilard Kolozsvári, M. to Baben, Peter Polcik, Marcus Hans, Lin Shang |
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| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Materials science Direct current Analytical chemistry chemistry.chemical_element 02 engineering and technology Substrate (electronics) Sputter deposition 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films chemistry Aluminium 0103 physical sciences High-power impulse magnetron sputtering Thin film 0210 nano-technology Instrumentation Deposition (law) Power density |
| Zdroj: | Vacuum. 145:285-289 |
| ISSN: | 0042-207X |
| DOI: | 10.1016/j.vacuum.2017.08.048 |
| Popis: | The effect of target power density, substrate bias potential and substrate temperature on the thin film composition was studied. A Cr-Al-C composite target was sputtered utilizing direct current (DCMS: 2.3 W/cm 2 ) and high power pulsed magnetron sputtering (HPPMS: 373 W/cm 2 ) generators. At floating potential, all Cr-Al-C thin films showed similar compositions, independently of the applied target power density. However, as substrate bias potential was increased to −400 V, aluminum deficiencies by a factor of up to 1.6 for DCMS and 4.1 for HPPMS were obtained. Based on the measured ion currents at the substrate, preferential re-sputtering of Al is suggested to cause the dramatic Al depletion. As the substrate temperature was increased to 560 °C, the Al concentration was reduced by a factor of up to 1.9 compared to the room temperature deposition. This additional reduction may be rationalized by thermally induced desorption being active in addition to re-sputtering. |
| Databáze: | OpenAIRE |
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