Autor: |
Roberto Gunnella, Georges Dufour, Paola Castrucci, R. Bernardini, S Pollano, François Rochet, M. De Crescenzi |
Rok vydání: |
2001 |
Předmět: |
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Zdroj: |
Surface Science. 489:185-190 |
ISSN: |
0039-6028 |
DOI: |
10.1016/s0039-6028(01)01176-1 |
Popis: |
Pseudomorphic c-SiC alloys on Si(1 1 1) were grown by exposure to acetylene (C 2 H 2 ) in ultra-high-vacuum conditions. The behavior of C incorporation in the lattice for different substrate growth temperatures was studied by UHV electronic techniques. We found that C atoms occupy tetrahedral substitutional sites in the Si lattice when the substrate temperature is kept below 650°C. With increasing temperature, up to 950°C, we have observed a substantial increase of the C atoms mainly bounded to silicon in nonsubstitutional sites in a nearly planar sp 2 configuration. This is evidenced by the analysis of the line shape of the near-edge energy loss and by extended energy loss fine structure measurements which are particularly sensitive to the bond length around each carbon atom. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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