Self-Aligned Selective Emitter for PERC based on Inkjetable UV-Polymer
| Autor: | Efinger, R., Kafle, B., Demel, K., Ellahi, T., Jahn, M., Meßmer, M., Horzel, J., Zimmer, M., Kluska, S., Shepherd, W., Pickrell, M., Hermans, J., Lohmüller, S., Lohmüller, E., Keding, R. |
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| Jazyk: | angličtina |
| Rok vydání: | 2020 |
| Předmět: | |
| DOI: | 10.4229/eupvsec20202020-2cv.1.47 |
| Popis: | 37th European Photovoltaic Solar Energy Conference and Exhibition; 388-393 In this study, we investigate and demonstrate the general feasibility of a new approach for a self-aligned selective emitter process technology for passivated emitter and rear cell (PERC) technology based on inkjet printing of an UV-polymer ink in combination with plating for metallization. First, we present the major findings about the single process development of inkjet printing (minimum printed structures of 36 μm), emitter etch-back (from Rsh = 80 Ω/sq to 144 Ω/sq with an etch time of 10 s), low temperature passivation (depositions temperatures of up to 250°C), a lift-off process (at elevated temperatures of 600°C) and demonstrate that the UV-polymer ink shows sufficient chemical and thermal stability to the processes involved. Finally, the successful integration into the PERC process sequence with upscaling to an industrial wafer size M2 and a first working cell device with an efficiency = 19.68% is demonstrated. In comparison, a conventional mask&etch selective emitter approach using inkjet printing of an hotmelt ink in combination with a semi-automated enhanced alignment algorithm between inkjet and screen printing is processed in parallel showing = 21.54% and a gain of = 0.16%abs compared to PERC cell with homogeneous emitter. |
| Databáze: | OpenAIRE |
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