Impact of buffer growth on crystalline quality of GaN grown on Si(111) substrates
Autor: | Henning Riechert, Philipp Drechsel, Martin Albrecht, Peter Stauss, Toni Markurt, Werner Bergbauer, Patrick Rode, S. Fritze, Alois Krost, Ulrich Dr. Steegmüller, Tobias Schulz |
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Rok vydání: | 2012 |
Předmět: |
Materials science
Silicon Aluminium nitride Nucleation chemistry.chemical_element Gallium nitride Surfaces and Interfaces Chemical vapor deposition Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Crystallography Silicon nitride chemistry Etching (microfabrication) Materials Chemistry Metalorganic vapour phase epitaxy Electrical and Electronic Engineering Composite material |
Zdroj: | physica status solidi (a). 209:427-430 |
ISSN: | 1862-6300 |
DOI: | 10.1002/pssa.201100477 |
Popis: | In this work we focus on the impact of different buffer and nucleation layers on the corresponding crystalline quality of gallium nitride (GaN), grown by metal-organic chemical vapour deposition (MOCVD). In situ curvature measurements, X-ray diffraction (XRD) and transmission electron microscopy (TEM) are used for advanced characterization. The influence of various growth modes on meltback etching and cracking is analyzed. Also the effect of a silicon nitride (SiN) mask on the growth of GaN and its coalescence is investigated. Furthermore, associated potential consequences for the growth of aluminium nitride (AlN) interlayers are examined to obtain a homogeneous surface without cracks and with good crystalline quality. Our studies indicate that an incomplete coalesced GaN surface located underneath the AlN interlayer leads to an increased defect density. Additionally we studied the influence of growth temperature at nucleation on the material quality and the process stability. Finally we demonstrate interlayer induced compressive strain during GaN growth with an XRD rocking-curve full width half maximum (FWHM) as low as 450 arc seconds for the reflection. |
Databáze: | OpenAIRE |
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