A comparison of He and Ne FIB imaging of cracks in microindented silicon nitride
| Autor: | Hongzhou Zhang, Y. Zhou, A. Baggott, B.J. Inkson, M. Mazaheri |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Mechanical Engineering chemistry.chemical_element 02 engineering and technology Edge (geometry) Intergranular corrosion 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Secondary electrons chemistry.chemical_compound Cracking Neon Silicon nitride chemistry Mechanics of Materials visual_art 0103 physical sciences visual_art.visual_art_medium General Materials Science Ceramic Composite material 0210 nano-technology Helium |
| Zdroj: | Materials Characterization. 141:362-369 |
| ISSN: | 1044-5803 |
| DOI: | 10.1016/j.matchar.2018.05.006 |
| Popis: | Helium ion microscopy (HIM) offers potential as a high spatial resolution technique for imaging insulating samples that are susceptible to charging artifacts. In this study helium and neon ion microscopy are used to image cracking in microindented samples of the non-conductive ceramic silicon nitride. The crack morphology of radial cracks emanating from the microindentations has been characterized for two different compositions of silicon nitride, with and without conductive coatings. Gold coating enhances crack edge contrast, but masks grain contrast for both He and Ne ion-induced secondary electron (ISE) imaging. Carbon coating enables the crystalline and glassy phases to be distinguished, more clearly with Ne-ISE, and the cracking pathway is found to be primarily intergranular. Zones of |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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