Reduction of recombination rates due to volume increasing, annealing, and tetraethoxysilicate treatment in hematite thin films
Autor: | Arthur Justin Harrison, Moshawe J. Madito, Mmantsae Diale, Alexander Tapera Paradzah, Huzifa Mohammed Ahamed Mohammed Elnour, S. Congolo, Tjaart P. J. Krüger |
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Rok vydání: | 2020 |
Předmět: |
Materials science
Annealing (metallurgy) Materials Science (miscellaneous) Analytical chemistry Nanochemistry 02 engineering and technology 010402 general chemistry 01 natural sciences symbols.namesake Ultrafast laser spectroscopy Electrical and Electronic Engineering Physical and Theoretical Chemistry Thin film Spectroscopy Cell Biology Hematite 021001 nanoscience & nanotechnology Tin oxide Atomic and Molecular Physics and Optics 0104 chemical sciences visual_art visual_art.visual_art_medium symbols 0210 nano-technology Raman spectroscopy Biotechnology |
Zdroj: | Applied Nanoscience. 10:1957-1967 |
ISSN: | 2190-5517 2190-5509 |
DOI: | 10.1007/s13204-020-01264-7 |
Popis: | We report on the properties of hematite thin films prepared by spray pyrolysis on fluorine-doped tin oxide (FTO)-coated glass substrates and investigated the effect of the spray volume, tetraethoxysilicate treatment of the hematite, and post-annealing at 500 °C for 2 h with 10 °C/min ramping. Raman spectroscopy confirmed the characteristic Raman spectrum of all the films, while high-resolution confocal Raman microscopy showed a uniform intensity, suggesting a homogeneous coating of the hematite films on the FTO substrates. Ultrafast transient absorption spectroscopy indicates that all three experimental parameters—a larger spray volume, tetraethoxysilicate treatment, and annealing—slowed down electron–hole recombination. Global analysis of the difference absorption data resolved the spectra and associated decay lifetimes of three distinct processes, operating on the ultrafast, tens of picoseconds, and hundreds of picoseconds timescales. |
Databáze: | OpenAIRE |
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