Electrical properties of boron-incorporated ultrananocrystalline diamond/hydrogenated amorphous carbon composite films
| Autor: | Satoshi Takeichi, Tsuyoshi Yoshitake, Satoshi Koizumi, Kazutaka Kamitani, Ryota Ohtani, YÅ«ki Katamune, Eiji Ikenaga, Takeharu Sugiyama |
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| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Materials science Composite number Fermi level Analytical chemistry Diamond chemistry.chemical_element 02 engineering and technology General Chemistry engineering.material 021001 nanoscience & nanotechnology 01 natural sciences symbols.namesake Amorphous carbon X-ray photoelectron spectroscopy chemistry Electrical resistivity and conductivity 0103 physical sciences engineering symbols General Materials Science Graphite 0210 nano-technology Boron |
| Zdroj: | Applied Physics A. 125 |
| ISSN: | 1432-0630 0947-8396 |
| Popis: | Boron-incorporated ultrananocrystalline diamond/hydrogenated amorphous carbon composite (UNCD/a-C:H) films were deposited by coaxial arc plasma deposition with boron-blended graphite targets. The effects of boron incorporation on the electrical properties of the films were investigated by hard X-ray photoelectron spectroscopy. Their electrical conductivity increased from 10−7 to 10−1 Ω−1 cm−1 with increasing boron content up to 5 at.%. From the temperature dependence of electrical conductivity, hopping conduction due to localized states produced by boron atoms is predominant in carrier transport. X-ray photoelectron spectra showed the shifts of Fermi levels toward the top of the valence band with increasing boron content. It implies that boron atoms in the films lead to form localized states, which results in enhanced electrical conductivity. |
| Databáze: | OpenAIRE |
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