Plasma Diagnostics and Characteristics of Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas

Autor:	Shih-Nan Hsiao, Yusuke Imai, Nikolay Britrun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Rok vydání:	2022
Zdroj:	2022 International Symposium on Semiconductor Manufacturing (ISSM).
DOI:	10.1109/issm55802.2022.10027112
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::46926ce90d5e44a7d1de0be504a3e585 https://doi.org/10.1109/issm55802.2022.10027112 Zobrazit plný text záznamu