Influence of Acid and Alkali Etching on Sputtered Aluminium Doped Zinc Oxide Films
| Autor: | Jayasree Roy Sharma, Sukanta Bose, A.K. Barua, Sumita Mukhopadhyay, Sourav Mandal, Gourab Das |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Potassium hydroxide Materials science Doping chemistry.chemical_element 02 engineering and technology Zinc 021001 nanoscience & nanotechnology Alkali metal 01 natural sciences chemistry.chemical_compound chemistry Chemical engineering Etching (microfabrication) Aluminium 0103 physical sciences Transmittance 0210 nano-technology Sheet resistance |
| Zdroj: | Materials Today: Proceedings. 5:9726-9732 |
| ISSN: | 2214-7853 |
| Popis: | In order to increase the efficiency of silicon based Thin Film Solar (TFS) cells, it is necessary to use better light management techniques. Texturization of sputtered aluminium doped zinc oxide (Al:ZnO or AZO) films has opened up a variety of ways for optimization of light trapping schemes. Here, AZO has been etched with acid as well as alkali. A difference in optical and electrical characteristics of acid and alkali etched AZO has been observed. By etching AZO with potassium hydroxide (KOH), 82% transmittance (in the visible range), high rms roughness and ∼13Ω/□ sheet resistance have been achieved. |
| Databáze: | OpenAIRE |
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