High Field Temperature-Independent Field-Effect Mobility of Amorphous Indium–Gallium–Zinc Oxide Thin-Film Transistors: Understanding the Importance of Equivalent-Oxide-Thickness Downscaling

Autor: Subhranu Samanta, Ying Wu, Xiao Gong, Shengqiang Xu, Kaizhen Han
Rok vydání: 2021
Předmět:
Zdroj: IEEE Transactions on Electron Devices. 68:118-124
ISSN: 1557-9646
0018-9383
DOI: 10.1109/ted.2020.3035737
Popis: We investigate the temperature dependence of field-effect mobility ( $\mu _{eff}$ ) on amorphous indium–gallium–zinc oxide ( $\alpha $ -IGZO) thin-film transistors (TFTs) having 10-nm-thick HfO2. Thanks for the downscaling of the equivalent oxide thickness (EOT), we observe, for the first time, a temperature-independent $\mu _{eff}$ at a high field or high carrier concentration ( ${N}_{carrier}$ ) regime and a strong temperature-dependent $\mu _{eff}$ at a low field or low ${N}_{carrier}$ regime. The observation highlights the importance of EOT downscaling to enhance ${N}_{carrier}$ and facilitate the Fermi level ( ${E}_{F}$ ) to approach and even exceed the potential barriers’ peak ( ${E}_{M}$ ), leading to a high and temperature-independent $\mu _{eff}$ at high ${N}_{carrier}$ . ${N}_{carrier}$ at which ${E}_{\textbf {F}} = {E}_{M}$ is extracted to be $\sim 6\times 10^{12}$ cm−2. A detailed study of the relationship between EOT scaling and the gate bias voltage ( ${V}_{GS}$ ) at which ${E}_{F}$ equals to ${E}_{M}$ is performed. $\alpha $ -IGZO TFTs with an ultrascaled gate dielectric are capable of alleviating the negative effects from the potential barriers at low ${V}_{GS}$ and could enable low-power applications with high performance. Besides, a weak temperature-dependent subthreshold swing (SS) of $\alpha $ -IGZO TFT was observed and explained.
Databáze: OpenAIRE