Langmuir probe studies of a helicon plasma system

Autor:	W. W. Dostalik, A D Springfield, T. P. Schneider, Robert Kraft
Rok vydání:	1999
Předmět:	Electron density Plasma parameters Chemistry Plasma Condensed Matter Physics symbols.namesake Helicon Physics::Plasma Physics symbols Electron temperature Langmuir probe Electromagnetic electron wave Plasma diagnostics Atomic physics
Zdroj:	Plasma Sources Science and Technology. 8:397-403
ISSN:	1361-6595 0963-0252
DOI:	10.1088/0963-0252/8/3/309
Popis:	A commercial Trikon Technologies, Inc. Pinnacle 8000 helicon source plasma system for semiconductor etching was characterized with a radio frequency compensated Langmuir probe. The plasma parameters, including electron temperature, ion and electron density were measured with changes in the process conditions. The coil current ratios for constant magnetic fields were varied to demonstrate flexibility to form uniform ion current densities in the plasma. The electron energy distribution functions were measured and indicate a two-temperature plasma near the wafer surface.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3752c18c6917110c2483ce743be9fa21 https://doi.org/10.1088/0963-0252/8/3/309 Zobrazit plný text záznamu