Influence of pH on the Quantum-Size-Controlled Photoelectrochemical Etching of Epitaxial InGaN Quantum Dots
| Autor: | Arthur J. Fischer, Xiaoyin Xiao, Michael E. Coltrin, Daniel D. Koleske, Jeffrey Y. Tsao, George T. Wang, Ping Lu |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Materials science
business.industry Nanotechnology Epitaxy Laser Surfaces Coatings and Films Electronic Optical and Magnetic Materials Quantum size law.invention Wavelength General Energy Quantum dot law Etching (microfabrication) Optoelectronics Photoelectrochemical etching Physical and Theoretical Chemistry Thin film business |
| Zdroj: | The Journal of Physical Chemistry C. 119:28194-28198 |
| ISSN: | 1932-7455 1932-7447 |
| Popis: | Illumination by a narrow-band laser has been shown to enable photoelectrochemical (PEC) etching of InGaN thin films into quantum dots with sizes controlled by the laser wavelength. Here, we investigate and elucidate the influence of solution pH on such quantum-size-controlled PEC etch process. We find that although a pH above 5 is often used for PEC etching of GaN-based materials, oxides (In2O3 and/or Ga2O3) form which interfere with quantum dot formation. At pH below 3, however, oxide-free QDs with self-terminated sizes can be successfully realized. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|