A Bulk Study of Homoepitaxy
Autor: | C. S. Baxter, R.E. Somekh |
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Rok vydání: | 1990 |
Předmět: | |
Zdroj: | MRS Proceedings. 202 |
ISSN: | 1946-4274 0272-9172 |
Popis: | We present preliminary results aimed at investigating the effects of variation in temperature on the epitaxial growth of thin films of single elements and multilayers.In this paper we present results of a cross-sectional electron microscopy study of films in which good epitaxy has been established and then the deposition temperature has been significantly reduced (for example to 30°C from 120°C). The main objective was to study the nature of the low temperature limit of layer by layer epitaxy and the degree of roughening as a function of the deposition conditions with an emphasis on the kinetics of the process. |
Databáze: | OpenAIRE |
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