Utilization of ß-Diketones for Etching and Cleaning of Metal Oxide and Sulfide Thin Films

Autor:	Mark J. Hampden-Smith, Ajay Jain, Steven R. Droes, Ross E. Muenchausen, Toivo T. Kodas
Rok vydání:	1993
Předmět:	chemistry.chemical_compound Materials science chemistry Etching (microfabrication) Scanning electron microscope Inorganic chemistry Oxide Wafer Reactive-ion etching Thin film Rutherford backscattering spectrometry Pulsed laser deposition
Zdroj:	MRS Proceedings. 300
ISSN:	1946-4274 0272-9172
Popis:	We are examining dry processes for wafer cleaning and producing patterned thin films of metal oxides. This research focuses on determining the kinetics and mechanism of the reaction between ß-diketones and selected metal oxides. Preliminary experiments indicated that CuO, MgO, PbO and ZnO all react readily with 1,1,1,5,5,5-hexafluoroacetylacetone (hfacH). Thin films of CuO and MgO were fabricated via pulsed laser deposition, characterized by various analytical techniques such as Rutherford Backscattering Spectrometry and Scanning Electron Microscopy, etched using hfacH, and then further characterized. Etching rates for CuO and MgO were measured in order to develop a mechanistic understanding of the reaction.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::309b738b312136625ac94a921e9619ed https://doi.org/10.1557/proc-300-471 Zobrazit plný text záznamu Full text from SpringerLink