Photoresists with precisely controlled molecular weight, composition and sequence

Autor:	Florian Käfer, Zoey Meng, Rachel A. Segalman, Javier Read de Alaniz, Christopher K. Ober
Rok vydání:	2023
Zdroj:	Advances in Patterning Materials and Processes XL.
DOI:	10.1117/12.2658582
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3052fceb2fe1f59641c10f247a9b0132 https://doi.org/10.1117/12.2658582 Zobrazit plný text záznamu