Characterization of surface modification mechanisms for boron nitride films under plasma exposure
Autor: | Tomoya Higuchi, Michiru Yamashita, Shigehiko Hasegawa, Keiichiro Urabe, Koji Eriguchi, Masao Noma |
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Rok vydání: | 2019 |
Předmět: |
010302 applied physics
Materials science 02 engineering and technology Surfaces and Interfaces General Chemistry Plasma Nanoindentation 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films Ion chemistry.chemical_compound chemistry Chemical engineering Boron nitride 0103 physical sciences Materials Chemistry Surface modification Irradiation 0210 nano-technology Nanoscopic scale Layer (electronics) |
Zdroj: | Surface and Coatings Technology. 377:124854 |
ISSN: | 0257-8972 |
Popis: | The surface modification of a boron nitride (BN) film by plasma exposure was investigated by means of nanoindentation analyses and molecular dynamics simulations. A μm-thick BN film composed of nanoscale sp3-bonded phases in the turbostratic (sp2-bonded) BN domain was prepared on a Si substrate using a reactive plasma-assisted coating system. Then, the BN films were exposed to an inductively coupled Ar plasma under various bias power conditions. The change of the morphology and mechanical properties in the surface region due to the plasma exposure was evaluated with respect to the dependence on the energy of incident Ar ions (Eion). A nanoindentation test under various contact depths identified the formation of a surface plasma-damaged layer (a few nm thick) where the nanoindentation hardness (HIT) was changed in response to the Ar ion irradiation. A molecular dynamics (MD) simulation predicted also the Eion-dependence of the reconstruction of the sp3-bonded phases in a few nm-thick layer on the surface. The presence of a damaged-layer plays an important role in the mechanical properties of the BN/Si structures. |
Databáze: | OpenAIRE |
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