Thermal stability of silicon-containing methacrylate-based bilayer resist for 193-nm lithography

Autor:	Daniela White, Bernard T. Beauchemin, Thomas Steinhaeusler, Andrew J. Blakeney
Rok vydání:	1998
Předmět:	chemistry.chemical_classification chemistry.chemical_compound Thermogravimetric analysis Monomer chemistry Silylation Bilayer Polymer chemistry Thermal decomposition Thermal stability Polymer Methacrylate
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.312383
Popis:	Thermal decomposition of silyl substituted methacrylate terpolymers containing acid sensitive groups was studied using thermogravimetric analysis. The onset of decomposition was found to be a function of the microenvironment, i.e. the molar % composition of the acid sensitive group monomer. The Flynn and Wall method ofestimating E a was used to estimate the E a for decomposition of the terpolymer and where possible, for the acid sensitive group.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2b507a59426b2e0891cc8cf6e95c0758 https://doi.org/10.1117/12.312383 Zobrazit plný text záznamu