Autor: |
R. Fackenthal, Ferdinando Bedeschi, Davide Erbetta, Roberto Bez, T. Marangon, G. Atwood, Enrico Varesi, Pietro Petruzza, Agostino Pirovano, M. Magistretti, R. Harrigan, Fabio Pellizzer, I. Tortorelli |
Rok vydání: |
2007 |
Předmět: |
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Zdroj: |
ESSDERC 2007 - 37th European Solid State Device Research Conference. |
DOI: |
10.1109/essderc.2007.4430918 |
Popis: |
A novel self-aligned muTrench-based cell architecture for phase change memory (PCM) process is presented. The low-programming current and the good dimensional control of the sub-lithographic features achieved with the muTrench structure are combined with a self-aligned patterning strategy that simplify the integration process in term of alignment tolerances and of number of critical masks. The proposed architecture has been integrated in a 90 nm 128 Mb vehicle with programming currents of 300 muA and good distributions, demonstrating its suitability for the production of high-density PCM arrays at 90 nm and beyond. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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