Self-aligned μTrench phase-change memory cell architecture for 90nm technology and beyond

Autor: R. Fackenthal, Ferdinando Bedeschi, Davide Erbetta, Roberto Bez, T. Marangon, G. Atwood, Enrico Varesi, Pietro Petruzza, Agostino Pirovano, M. Magistretti, R. Harrigan, Fabio Pellizzer, I. Tortorelli
Rok vydání: 2007
Předmět:
Zdroj: ESSDERC 2007 - 37th European Solid State Device Research Conference.
DOI: 10.1109/essderc.2007.4430918
Popis: A novel self-aligned muTrench-based cell architecture for phase change memory (PCM) process is presented. The low-programming current and the good dimensional control of the sub-lithographic features achieved with the muTrench structure are combined with a self-aligned patterning strategy that simplify the integration process in term of alignment tolerances and of number of critical masks. The proposed architecture has been integrated in a 90 nm 128 Mb vehicle with programming currents of 300 muA and good distributions, demonstrating its suitability for the production of high-density PCM arrays at 90 nm and beyond.
Databáze: OpenAIRE