C4F8 dissociation in an inductively coupled plasma
| Autor: | David B. Graves, M. T. Radtke, J. W. Coburn |
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| Rok vydání: | 2003 |
| Předmět: |
Number density
Chemistry Analytical chemistry Surfaces and Interfaces Condensed Matter Physics Mass spectrometry Dissociation (chemistry) Surfaces Coatings and Films Ion symbols.namesake Physics::Plasma Physics Ionization Physics::Atomic and Molecular Clusters symbols Langmuir probe Plasma diagnostics Inductively coupled plasma Atomic physics |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:1038-1047 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.1582456 |
| Popis: | A study of the dissociation of a small concentration of cyclic-C4F8 (c-C4F8) in a predominately argon, low pressure inductively coupled plasma is reported. Measurements of electron density, plasma potential, and electron energy distribution function (EEDF) were made at several pressures and over a range of dilute Ar/C4F8 plasmas using a Langmuir probe. The c-C4F8 concentration in the plasma was estimated using appearance potential mass spectrometry and ion mass spectrometry. Optical emission spectroscopy was used to estimate the gas temperature and total neutral number density. Volume-averaged total dissociation rate coefficients for c-C4F8 ionization and total dissociation into neutrals were calculated using reported cross sections and the measured EEDFs. Rate coefficients inferred by both methods were in agreement within experimental uncertainties and approximations of the model, indicating that the dissociation cross sections are accurate. |
| Databáze: | OpenAIRE |
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