Preparation and optimization of SnOx thin film by solution method at low temperature
Autor: | Qiannan Ye, Jinxiong Li, Xiuhua Cao, Jiangxia Huang, Honglong Ning, Xianzhe Liu, Zhang Xu, Shuang Wang, Junbiao Peng, Rihui Yao, Danqing Hou |
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Rok vydání: | 2020 |
Předmět: |
010302 applied physics
Spin coating Materials science 02 engineering and technology Surface finish Substrate (electronics) 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Impurity 0103 physical sciences Transmittance General Materials Science Electrical and Electronic Engineering Thin film Composite material 0210 nano-technology Solution process Visible spectrum |
Zdroj: | Superlattices and Microstructures. 139:106400 |
ISSN: | 0749-6036 |
DOI: | 10.1016/j.spmi.2020.106400 |
Popis: | SnOx films were prepared by sol-gel spin coating technology on glass substrates at low temperature. Through the optimization of the solution process, the quality of the film was effectively improved. And the effects of rotating speed, substrate pretreatment and precursor concentration and other parameters on the films were emphatically discussed. It is found that the formation of the impurity particles and holes can be reduced and the film roughness can be decreased by treating the substrate with plasma. Adding a low-speed spin coating process before high-speed spin coating can significantly reduce the roughness of film. The roughness of film decreases, and the edge shrinkage phenomenon of film is improved with the increasing spin-coating speed. The thickness of the film increases linearly with the solution concentration, but the high concentration of precursor is easy to lead to the cracks of films. Based on the optimized solution process, SnOx films with flat, smooth surface (Rq = 0.25 nm) and high transparency (visible light transmittance >90%) can be prepared at low temperature, which is expected to be used in devices based on transparent films. |
Databáze: | OpenAIRE |
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