X-ray photoelectron spectra of adhesion-enhanced a-Si:H on stainless steel induced by plasma treatments
| Autor: | Pavel Bulkin, N. Bertrand, C. Sénémaud, Bernard Drevillon, P.A Bonnefont, A Gheorghiu-de La Rocque |
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| Rok vydání: | 1998 |
| Předmět: |
Materials science
Hydrogen Silicon Analytical chemistry chemistry.chemical_element Condensed Matter Physics Electronic Optical and Magnetic Materials chemistry.chemical_compound Chemical state Chemical bond chemistry X-ray photoelectron spectroscopy Silicon nitride Chemical engineering Materials Chemistry Ceramics and Composites Hardening (metallurgy) Metallic bonding |
| Zdroj: | Journal of Non-Crystalline Solids. :59-62 |
| ISSN: | 0022-3093 |
| Popis: | An investigation by X-ray photoelectron spectroscopy (XPS) of adhesion mechanisms of a-Si:H films on stainless steel substrates after hydrogen (H2), nitrogen (N2) and ammonia (NH3) plasma treatments of the surface is presented. It is shown that adhesion is increased by N2 treatment. This effect is related to chemical bonding states at the interface. The improvement is attributed to the formation of silicon nitride at the interface and to the existence of Fe–Fe metallic bonds which contribute to a hardening of the substrate. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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