TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn+, C60+and Cs+sputtering ions: A comparative study
| Autor: | T. Tabarrant, Arnaud Delcorte, Patrick Bertrand, Laurent Houssiau, J. Brison, Ewald Niehuis, Nimer Wehbe, Rudolf Moellers, Taoufiq Mouhib |
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| Rok vydání: | 2012 |
| Předmět: |
Argon
010401 analytical chemistry Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry 010402 general chemistry Condensed Matter Physics 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Ion chemistry Sputtering Materials Chemistry Cluster (physics) Order of magnitude |
| Zdroj: | Surface and Interface Analysis. 45:178-180 |
| ISSN: | 0142-2421 |
| DOI: | 10.1002/sia.5121 |
| Popis: | The performance of Cs+, C60 + and Ar n + (with n ≈ 1700) sputtering ions have been compared for depth profiling multilayer films made from three evaporated phenylalanine layers sandwiched between four thicker evaporated tyrosine layers. Using Cs +, the ion signals and depth resolution degrade with depth and were significantly affected beyond a 200-nm depth. The depth profiling quality was more successful using C60 +. However, in this case, the depth resolution and the layer width values still degrade with the sputtered depth and are particularly poor after reaching a depth of about 400 nm. When Ar1700 + clusters were used, a depth resolution as low as 6 nm was obtained, and this value never exceeds 9 nm. Moreover, the experimental layer width is found to be of the same order of magnitude as the real value. Copyright © 2012 John Wiley & Sons, Ltd. Copyright © 2012 John Wiley & Sons, Ltd. |
| Databáze: | OpenAIRE |
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