Low-Temperature Growth of Ferroelectric Hf0.5Zr0.5O2 Thin Films Assisted by Deep Ultraviolet Light Irradiation

Autor: Won-June Lee, Dipjyoti Das, Seungbum Hong, WooJun Seol, Hoon Kim, Tae Yeon Kim, Jun Young Lee, Ji Young Jo, Gopinathan Anoop, Myung-Han Yoon, Sanghun Jeon, Jiwon Yeom, Hyunjin Joh
Rok vydání: 2021
Předmět:
Zdroj: ACS Applied Electronic Materials. 3:1244-1251
ISSN: 2637-6113
DOI: 10.1021/acsaelm.0c01065
Popis: Low-temperature deposition of inorganic ferroelectric (FE) thin films is highly demanded for lowering the environmental impact through lesser energy consumption. Doped HfO2-based FE thin films comm...
Databáze: OpenAIRE