Computer aided proximity correction for direct write E-beam lithography
| Autor: | M. Madore, E. Knapek, C. K. Kalus, Magdalena Hintermaier, R. Schlager, U. Hofmann, H. Scherrer-Winner |
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| Rok vydání: | 1991 |
| Předmět: |
Hierarchy
Critical structure Workstation business.industry Computer science Condensed Matter Physics Grid Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Software Computer engineering Application-specific integrated circuit law Computer-aided Electrical and Electronic Engineering business Electron-beam lithography |
| Zdroj: | Microelectronic Engineering. 13:181-184 |
| ISSN: | 0167-9317 |
| Popis: | First results of an evolutionary software project are presented. It aims at improving high resolution of many different e-beam writers and will be available on workstations. Selecting critical structure details and preserving hierarchy are key issues to cut down computer time. An “ASIC” and an optical grid were written with CAPROX. Critical dimensions are in good agreement with nominal values as opposed to uncorrected patterns. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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