Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements

Autor:	Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno J. van Leest, Simon G. J. Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan N. Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren
Rok vydání:	2023
Zdroj:	Metrology, Inspection, and Process Control XXXVII.
DOI:	10.1117/12.2658330
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1a615ca4fc836a6d74b3192dd259fc1d https://doi.org/10.1117/12.2658330 Zobrazit plný text záznamu