Focused ion beam sculpted membranes for nanoscience tooling

Autor:	Christian Ulysse, í. Bourhis, Loïc Auvray, Jacques Gierak, Jean-Christophe Galas, Xavier Lafosse, Gilles Patriarche, G. Oukhaled, Ali Madouri, Yong Chen, Anne-Laure Biance
Rok vydání:	2006
Předmět:	Materials science Drill High resolution Nanotechnology Condensed Matter Physics Focused ion beam Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nanopore Membrane Sputtering Miniaturization Nanometre Electrical and Electronic Engineering
Zdroj:	Microelectronic Engineering. 83:1474-1477
ISSN:	0167-9317
DOI:	10.1016/j.mee.2006.01.133
Popis:	High resolution FIB offers nowadays the capability to sculpt matter at the nanometer scale. Using FIB to engrave membranes opens new emerging routes for nanoscience tooling. We propose here a way to fabricate tensile SiC membranes (with thicknesses adjustable between 10 and 100nm), in order to drill them with high resolution focused ion beam, to obtain holes below 15nm. Moreover, we show how we can, in some specific conditions, take advantage of the behavior of the irradiated matter (sputtering/redeposition processes) to reduce the size of the drilled hole below 10nm. Eventually, we present two applications of these objects in biophysics and nanoscience tooling.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0e3cee87551bb6a9832270081ca5944c https://doi.org/10.1016/j.mee.2006.01.133 Zobrazit plný text záznamu Full Text from ScienceDirect