Chemically modified Si(111) surfaces simultaneously demonstrating hydrophilicity, resistance against oxidation, and low trap state densities
| Autor: | Elizabeth S. Brown, Sofiya Hlynchuk, Stephen Maldonado |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Trimethylsilyl
Silicon Photoconductivity Analytical chemistry chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Contact angle chemistry.chemical_compound chemistry Attenuated total reflection Reagent Materials Chemistry Reactivity (chemistry) 0210 nano-technology Spectroscopy |
| Zdroj: | Surface Science. 645:49-55 |
| ISSN: | 0039-6028 |
| DOI: | 10.1016/j.susc.2015.10.056 |
| Popis: | Chemically modified Si(111) surfaces have been prepared through a series of wet chemical surface treatments that simultaneously show resistance towards surface oxidation, selective reactivity towards chemical reagents, and areal defect densities comparable to unannealed thermal oxides. Specifically, grazing angle attenuated total reflectance infrared and X-ray photoelectron (XP) spectroscopies were used to characterize allyl-, 3,4-methylenedioxybenzene-, or 4-[bis(trimethylsilyl)amino]phenyl-terminated surfaces and the subsequently hydroxylated surfaces. Hydroxylated surfaces were confirmed through reaction with 4-(trifluoromethyl)benzyl bromide and quantified by XP spectroscopy. Contact angle measurements indicated all surfaces remained hydrophilic, even after secondary backfilling with CH3 groups. Surface recombination velocity measurements by way of microwave photoconductivity transients showed the relative defect-character of as-prepared and aged surfaces. The relative merits for each investigated surface type are discussed. |
| Databáze: | OpenAIRE |
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