Enhancing the stability of copper chromite catalysts for the selective hydrogenation of furfural using ALD overcoating

Autor:	Christopher L. Marshall, James A. Dumesic, Jeffrey T. Miller, Hongbo Zhang, Yu Lei, M. Cem Akatay, Fred G. Sollberger, Eric A. Stach, Fabio H. Ribeiro, Jeffrey W. Elam, A. Jeremy Kropf, Guanghui Zhang
Rok vydání:	2014
Předmět:	integumentary system Inorganic chemistry Copper chromite Activation energy Furfural Catalysis X-ray absorption fine structure Furfuryl alcohol chemistry.chemical_compound Atomic layer deposition chemistry Physical and Theoretical Chemistry Layer (electronics)
Zdroj:	Journal of Catalysis. 317:284-292
ISSN:	0021-9517
DOI:	10.1016/j.jcat.2014.07.007
Popis:	The stability of a gas-phase furfural hydrogenation catalyst (CuCr2O4⋅CuO) was enhanced by depositing a thin Al2O3 layer using atomic layer deposition (ALD). Based on temperature-programed reduction (TPR) measurements, the reduction temperature of Cu was raised significantly, and the activation energy for furfural reduction was decreased following the ALD treatment. Thinner ALD layers yielded higher furfural hydrogenation activities. X-ray absorption fine structure (XAFS) spectroscopy studies indicated that Cu1+/Cu0 are the active species for furfural reduction.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0b21287d42b8f427e8f77d5e6c16f45c https://doi.org/10.1016/j.jcat.2014.07.007 Zobrazit plný text záznamu Full Text from ScienceDirect