Threshold Levels and Effects of Feed Gas Impurities on Plasma Etching Processes
Autor: | Herbert H. Sawin, Linda D. Baston, Gavin C. H. Zau, Igor Tepermeister, Michael T. Mocella, David C. Gray |
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Rok vydání: | 1990 |
Předmět: |
Plasma etching
Silicon Renewable Energy Sustainability and the Environment Kinetics Analytical chemistry chemistry.chemical_element Photoresist Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Impurity Materials Chemistry Electrochemistry Reactive-ion etching |
Zdroj: | Journal of The Electrochemical Society. 137:3526-3536 |
ISSN: | 1945-7111 0013-4651 |
Databáze: | OpenAIRE |
Externí odkaz: |