Potassium Titanyl Phosphate Sputtering Features by Argon Cluster Ions

Autor:	I. V. Nikolaev, M. A. Roenko, N. G. Korobeishchikov
Rok vydání:	2020
Předmět:	Argon Materials science Ion beam Physics::Instrumentation and Detectors Analytical chemistry Potassium titanyl phosphate chemistry.chemical_element Ion chemistry.chemical_compound chemistry Physics::Plasma Physics Sputtering Surface roughness Cluster (physics) sense organs Single crystal
Zdroj:	2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE).
Popis:	In this paper, we consider features of changes in surface morphology of potassium titanyl phosphate single crystal at the treatment of the argon cluster ion beam. It demonstrated that the sputtering process of the target surface at the small energy per atom in the cluster leads to a subnanometer level of the surface roughness. The sputtering yields and etching rates of potassium titanyl phosphate have been determined for small energy per atom in the argon cluster. We analyze the complex characteristic of surface quality is the power spectral density function of surface roughness for studying the surface smoothing effect of KTP single crystals by argon cluster ions.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::053b5fccf3e23b2cb4a7d25b1c18ddd6 https://doi.org/10.1109/efre47760.2020.9242181 Zobrazit plný text záznamu