Vacuum rapid thermal annealing of quartz resonators
| Autor: | G Beshkov, V Lazarova, Ts Yordanov, L. Spassov |
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| Rok vydání: | 2002 |
| Předmět: |
Resistive touchscreen
Materials science Annealing (metallurgy) Analytical chemistry chemistry.chemical_element Condensed Matter Physics Surfaces Coatings and Films Resonator chemistry Electrical resistivity and conductivity Aluminium Electrode Rapid thermal annealing Composite material Instrumentation Quartz |
| Zdroj: | Vacuum. 69:379-383 |
| ISSN: | 0042-207X |
| Popis: | The influence of rapid thermal annealing (RTA) on quartz resonator equivalent dynamic parameters has been investigated aiming to establish the parameter changes resulting from such a treatment. The resonators have been formed on AT-cut quartz substrates of high temperature stability. Two kinds of electrode materials have been used: Ag, deposited by vacuum resistive evaporation at 2×10 –4 Pa and E-beam evaporated Al. The electrode thickness was 1200 A. RTA was performed by bilateral radiation heating in a vacuum of 6.66×10 −3 Pa at heater temperatures of 700°C, 800°C and 900°C and time durations of 15–180 s, respectively. Highly thermosensitive quartz resonators measured the real temperatures of annealing. A Selective level meter PSM-14—from Wandel and Goldermann registered the changes in resonator equivalent parameters before and after RTA. A correlation was been found between measured resonator characteristics and the RTA parameters. As a result the exact RTA conditions (temperature and time duration) were determined under which resonator characteristics improved or deteriorated, depending on the kind of electrode material. |
| Databáze: | OpenAIRE |
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