Discharge frequency and reagents choice effects on robustness of silicon nitride (Si3N4) thin layers deposited by PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Autor:	Cazako, Catheline, Inal, Karim, Burr, Alain, Georgi, Frédéric, Cauro, Rodolphe
Přispěvatelé:	Centre de Mise en Forme des Matériaux (CEMEF), MINES ParisTech - École nationale supérieure des mines de Paris, Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Centre National de la Recherche Scientifique (CNRS)
Jazyk:	angličtina
Rok vydání:	2017
Předmět:	[SPI.MECA.MEMA]Engineering Sciences [physics]/Mechanics [physics.med-ph]/Mechanics of materials [physics.class-ph] [CHIM.CRIS]Chemical Sciences/Cristallography [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] [SPI.GPROC]Engineering Sciences [physics]/Chemical and Process Engineering [PHYS.PHYS.PHYS-CHEM-PH]Physics [physics]/Physics [physics]/Chemical Physics [physics.chem-ph] [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ComputingMilieux_MISCELLANEOUS [SPI.MAT]Engineering Sciences [physics]/Materials
Zdroj:	European Conference on Heat Treatment and Surface Engineering European Conference on Heat Treatment and Surface Engineering, Jun 2017, Nice, France
Popis:	International audience
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::16078f4cc910f459a3cd45821d5b978a https://hal-mines-paristech.archives-ouvertes.fr/hal-01721378 Zobrazit plný text záznamu