| Popis: |
Magnetron sputtering belongs to the most important methods of production of thin films with a wide range of physical properties. Examples include hard, wear-resistant coatings, low friction ones, corrosion resistant ones as well as coatings with specific electrical or optical properties. During the development the basic sputtering process has been significantly improved and nowadays there are a number of various techniques of magnetron sputtering. Pulsed magnetron sputtering presents one of these techniques. The pulsed regime is especially suitable for the deposition of insulating layers because there occurs no effect of charging up of the target followed by arc events. The fact that pulsed sputtering allows reducing the substrate temperature during the deposition is also important. This thesis deals with the low-temperature plasma in magnetron discharge generated by pulsed DC voltage. The measurement was carried out in the experimental apparatus of the cylindrical magnetron. The plasma diagnostics was performed by means of the electrostatic Langmuir and emissive probe. The dependencies of the basic plasma parameters, i.e. electron density, electron temperature and plasma potential, were evaluated with time and spatial resolution. The dependencies on pressure, length of the voltage pulse and the value of... |
