| Autor: |
Hitchon, W. N.G., Keiter, E. R. |
| Zdroj: |
Journal of Computational Physics; June 1994, Vol. 112 Issue: 2 p226-233, 8p |
| Abstrakt: |
The distribution function of ions is calculated in a two-dimensional plasma with a rapidly expanding sheath, self-consistently with the electrostatic potential, φ. The numerical procedure consists of a direct solution of an integral form of the kinetic equation. This solution relies on the use of a simple form for the Green's function which describes the time-evolution of the distribution, which has previously been used in one spatial dimension and is here extended to two dimensions. The electron density n0 is assumed to be described by the Boltzmann relation. n0 n0exp(cφ/κT0), allowing Poisson's equation to be solved for φ self-consistently with the ion density. This procedure is applied to describe the plasma surrounding a "target" to which is rapidly applied a large negative potential, as occurs in plasma source ion implantation (PSII). The ion distribution striking the target is calculated to allow determination of the dose and depth profile. Copyright 1994, 1999 Academic Press |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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