Main chain scission resists towards high-NA EUV lithography
| Autor: | Guerrero, Douglas, Amblard, Gilles R., Shirotori, Akihide, Oda, Yuji, Zhang, Rui, Taguchi, Kazunori, Sato, Nobuhiro, Yeh, Sin Fu, Suh, Hyo Seon, De Simone, Danilo, Vandenberghe, Geert, Sanuki, Hideaki |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129570P-129570P-11, 12827442p |
| Databáze: | Supplemental Index |
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