CDSAXS study of 3D NAND channel hole etch pattern edge effects and etched hole pattern variance

Autor: Sendelbach, Matthew J., Schuch, Nivea G., Zhang, Jin, Lan, Tian, Gao, Ying, Sorkhabi, Osman, Lin, Yung-Yi, Li, Maggie, Oak, Dave, Tan, Zhengquan
Zdroj: Proceedings of SPIE; April 2024, Vol. 12955 Issue: 1 p1295539-1295539-9
Databáze: Supplemental Index