Displacement Talbot lithography process simulation analysis

Autor: Liang, Ted, Kim, Seong-Sue, Dawes, Andrew M. C., Wang, Zhixin, Melvin, Lawrence S., Kuechler, Bernd, Demmerle, Wolfgang, Blais, Al, Wooley, Kelsey, Solak, Harun H.
Zdroj: Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p127510C-127510C-8, 1147599p
Databáze: Supplemental Index